CleanAutoload
General features
Intelligent wafer handling meets experienced wafer processing.
A robot transfers the wafer batch from loadport into the process chamber.
Clever assembly of process modules.
Small process module footprint combined with smart wafer handling.
The inline spiking technology allows for spiking tiny amounts of acids into a DI water flow.
Ozone replaces conventional medias and brings their applications of PR strip and Clean to its masterpiece.
Optional automation features
For enhanced wafer handling efficiency, we offer dedicated handlers specifically designed for dirty in/clean out processes. These specialized handlers ensure optimal cleanliness and prevent cross-contamination, maintaining the highest standards of wafer integrity.
To capture your unique process requirements, our equipment includes dedicated handlers for both left and right process chambers. This tailored approach maximizes workflow flexibility, enabling seamless integration into your existing setup for improved productivity and convenience.
Wafer size
Wafer materials
Feasible applications
Suitable features
Countable benefits
This four-chamber system features point-of-use mixed chemicals combined with the patented Retainer Comb Handling system to deliver superior process results. With sustainable processes like cleaning or resist stripping using SicOzone instead of peroxide and sulfuric acid, savings of up to 90% in the consumption of chemicals and DI water can be achieved.
Compared to conventional processes
Green Goals. Yellow Solutions.
Technology is all around us, shaping our daily lives and making them better. Siconnex is redefining progress by merging technology and sustainability, no longer presenting them as opposites. Sustainable technology for the progress of tomorrow. Green Goals. Yellow Solutions.
FAQs
The retainer combs are dedicated to a process chamber and they remain in the chamber while in idle mode.